The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2025

Filed:

Apr. 18, 2023
Applicant:

Velocity Image Processing Llc, Needham, MA (US);

Inventors:

Robert P. Bishop, Tiverton, RI (US);

Timothy Pinkney, Naples, FL (US);

Assignee:

Velocity Image Processing LLC, Tiverton, RI (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/64 (2006.01); G06T 7/521 (2017.01); G06T 7/70 (2017.01); H04N 23/67 (2023.01);
U.S. Cl.
CPC ...
G01N 21/6489 (2013.01); G01N 21/645 (2013.01); G06T 7/521 (2017.01); G06T 7/70 (2017.01); H04N 23/671 (2023.01); G06T 2207/10064 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A method and apparatus to maintain image focus on parts such as wafers, circuit boards, or high-density substrates as the part is being inspected. Focus performance is independent of feature and trace orientation and density. This apparatus can be easily integrated into an inspection system and can maintain focus on parts with high aspect ratio structures and or low or non-reflective insulators. It enables the inspection of high-density fine line products requiring the use of high resolution, high numerical aperture (NA) imaging optics with small depths of focus (DOF) that must be kept in focus during the inspection.


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