The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2025
Filed:
Oct. 26, 2021
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Jae-Byum Chang, Daejeon, KR;
Jueun Sim, Daejeon, KR;
Korea Advanced Institute of Science and Technology, Daejeon, KR;
Abstract
Provided are the nucleic acid-mediated pattern replication and a method of manufacturing a 2-D material using the same. A method of manufacturing a 2-D material according to an embodiment may include preparing a first material having a first nucleic acid patterned on a surface thereof, bonding a linker-nucleic acid to the first nucleic acid, bonding the first nucleic acid and a second nucleic acid attached to a surface of a second material through the linker-nucleic acid and replicating a pattern of the first material to the surface of the second material, separating the first material, and applying a third material on a pattern replicated to the surface of the second material.