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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12497501 B1

PDFFull Text
Date of Patent:
Dec. 16, 2025

Filed:

Nov. 01, 2019

Carboxylic acid-modified nitrile-based copolymer latex composition, latex composition for dip molding including the same, and molded article therefrom

Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Jung Eun Kim, Daejeon, KR;

Ji Hyun Kim, Daejeon, KR;

Seung Uk Yeu, Daejeon, KR;

Assignee:

LG Chem, Ltd., Seoul, KR;

Attorney:

Lerner David LLP

Primary Examiner:

Karuna P Reddy

Int. Cl.
CPC ...
C08F 220/46 (2006.01); B29C 41/00 (2006.01); B29C 41/14 (2006.01); C08F 36/06 (2006.01); C08K 3/06 (2006.01); C08K 3/22 (2006.01); C08K 5/00 (2006.01); C08L 13/02 (2006.01); B29K 19/00 (2006.01); B29K 33/18 (2006.01); C08F 220/28 (2006.01); C08F 228/02 (2006.01);
U.S. Cl.
CPC ...
C08L 13/02 (2013.01); B29C 41/003 (2013.01); B29C 41/14 (2013.01); C08F 220/46 (2013.01); C08K 3/06 (2013.01); C08K 3/22 (2013.01); C08K 5/0025 (2013.01); B29K 2019/00 (2013.01); B29K 2033/18 (2013.01); C08F 220/283 (2020.02); C08F 228/02 (2013.01); C08K 2003/2296 (2013.01);
Abstract

Provided is a carboxylic acid-modified nitrile-based copolymer latex composition, and more particularly, a carboxylic acid-modified nitrile-based copolymer latex composition including a carboxylic acid-modified nitrile-based copolymer. The carboxylic acid-modified nitrile-based copolymer includes a carboxyalkyl (meth)acrylate monomer-derived repeating unit and a repeating unit derived from an ethylenic unsaturated sulfonic acid monomer including a sulfonate salt or a sulfonate ester. A latex composition for dip molding including the same, and a molded article therefrom are also provided.

Find Patent Forward Citations

Kim, Jung. (2025). Carboxylic acid-modified nitrile-based copolymer latex composition, latex composition for dip molding including the same, and molded article therefrom (U.S. Patent No. 12497501). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12497501

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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