The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2025
Filed:
May. 06, 2021
Nanyang Technological University, Singapore, SG;
Hongwei Duan, Singapore, SG;
Ling Bai, Singapore, SG;
NANYANG TECHNOLOGICAL UNIVERSITY, Singapore, SG;
Abstract
An aspect of the disclosure relates to a thin film including an amorphous array of particles including a top surface and a bottom surface opposing each other, the thin film exhibiting thin film interference and further coherent scattering from the amorphous array of particles, wherein the thin film may include first regions and second regions, wherein the thin film interference of the second regions may be suppressed as compared to the first regions. Another aspect of the disclosure relates to a product including an indicium including a thin film in accordance with any of the previous claims, wherein the indicium may include an encoded pattern encoded by the relative position of the second regions to the first regions, wherein the encoded pattern may be visible under specular reflection of light of a pre-determined wavelength. Another aspect of the disclosure relates to a method of producing a thin film.