The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2025
Filed:
Dec. 15, 2022
Applicant:
Postech Research and Business Development Foundation, Pohang-si, KR;
Inventors:
Assignee:
POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION, Pohang-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J 20/08 (2006.01); B01J 20/12 (2006.01); B01J 20/30 (2006.01); C01G 29/00 (2006.01); C01G 51/82 (2025.01); C01G 53/82 (2025.01);
U.S. Cl.
CPC ...
B01J 20/08 (2013.01); B01J 20/12 (2013.01); B01J 20/3042 (2013.01); B01J 20/3085 (2013.01); C01G 29/006 (2013.01); C01G 51/82 (2025.01); C01G 53/82 (2025.01); C01P 2002/22 (2013.01);
Abstract
The present invention relates to a method of preparing a buffer material composed of bentonite modified with a layered double hydroxide (LDH) as a buffer material used for deep geological disposal of radioactive waste, the method including a step (a) of producing a first mixture by adding a compound containing a divalent cationic material, aluminum nitrate (Al(NO)), and bismuth nitrate (Bi(NO)) to a reactor.