The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2025
Filed:
Jan. 09, 2023
Coldplasmatech Gmbh, Greifswald, DE;
Martin Polak, Hinrichshagen, DE;
Robert Banaschik, Broderstorf, DE;
Axel Kühle, Greifswald, DE;
Tobias Güra, Eggesin, DE;
Carsten Mahrenholz, Lubmin, DE;
COLDPLASMATECH GMBH, Greifswald, DE;
Abstract
A plasma applicator comprising an electrotechnical core for generating a cold atmospheric pressure or low-pressure plasma for the treatment of human and/or animal and/or technical surfaces, wherein the electrotechnical core has a side facing the surface to be treated and a side facing away from the surface to be treated and comprises the following layers, arranged above one another, starting from the side facing the surface to be treated, a first insulation layer, a first electrode structure which is provided with a first contact for establishing electrical contact between the first electrode structure and a power supply unit and which is grounded during operation, a second insulation layer, which is embodied to galvanically isolate the first electrode structure and a second electrode structure from one another, a second electrode structure which is provided with a second contact for establishing electrical contact between the second electrode structure and a power supply unit and which is driven during operation by a voltage signal that is supplied by a power supply unit and that is sufficient to ignite a plasma, a third insulation layer, which is embodied to galvanically isolate the second electrode structure and a third electrode structure from one another, and a third electrode structure which is provided with a third contact in order to ground the third electrode structure during operation, the plasma applicator further comprising an enclosure, wherein the plasma applicator is affixed to a bag, said bag being configured to enclose a body or body segment and to thus form a sealed gas space around the body or body segment.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile