The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2025

Filed:

Dec. 06, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Cheng-Wei Cheng, White Plains, NY (US);

Robert L. Bruce, White Plains, NY (US);

Matthew Joseph Brightsky, Armonk, NY (US);

Gloria Wing Yun Fraczak, Queens, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10N 70/00 (2023.01); H10B 63/00 (2023.01); H10N 70/20 (2023.01);
U.S. Cl.
CPC ...
H10N 70/023 (2023.02); H10B 63/80 (2023.02); H10N 70/063 (2023.02); H10N 70/068 (2023.02); H10N 70/231 (2023.02); H10N 70/841 (2023.02); H10N 70/883 (2023.02);
Abstract

A bottom electrode is deposited on a substrate. A dielectric layer is deposited on the bottom electrode. One or more structures are patterned within the dielectric layer. A liner layer is deposited on top of the dielectric layer and the bottom electrode. A selectivity promotion layer is deposited on top of the liner layer. The selectivity promotion layer is etched to expose a top surface of the dielectric layer and a portion of the bottom electrode. A phase change memory material layer is deposited within a void of the one or more structures between the selectivity promotion layer.


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