The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2025
Filed:
Nov. 23, 2021
Applicant:
Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Shenzhen, CN;
Inventor:
Jianrong Chen, Shenzhen, CN;
Assignee:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10K 71/00 (2023.01); H10K 59/122 (2023.01); H10K 59/80 (2023.01); H10K 71/40 (2023.01);
U.S. Cl.
CPC ...
H10K 71/621 (2023.02); H10K 59/122 (2023.02); H10K 59/80522 (2023.02); H10K 71/40 (2023.02);
Abstract
Embodiments of the present application disclose a method of processing a photoresist layer, a method of manufacturing a display panel, and a display panel. By performing two exposure processes and one development process on a negative photoresist layer, an undercut structure can be obtained, effectively simplifying a process of manufacturing the undercut structure, thereby improving the production efficiency.