The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2025

Filed:

Nov. 10, 2021
Applicant:

Korea Research Institute of Standards and Science, Daejeon, KR;

Inventors:

Jiman Choi, Daejeon, KR;

Yonuk Chong, Seoul, KR;

Gahyun Choi, Daejeon, KR;

Kibog Park, Ulsan, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10F 77/40 (2025.01); B82Y 20/00 (2011.01); H01B 12/04 (2006.01); H10F 30/21 (2025.01); H10F 71/00 (2025.01);
U.S. Cl.
CPC ...
H10F 77/413 (2025.01); H01B 12/04 (2013.01); H10F 30/21 (2025.01); H10F 71/00 (2025.01); B82Y 20/00 (2013.01);
Abstract

A light detection device having improved self-alignment precision using a hard mask, and a method for manufacturing the same is provided. A method of manufacturing a light detection device includes i) providing a substrate; ii) providing a light reflecting portion on the substrate; iii) providing a light detection portion on the light reflection portion; iv) providing an anti-reflection portion provided on the light reflection portion to cover the light detection portion; v) removing each of the first outer periphery of the light reflection portion and the second outer periphery of the anti-reflection portion, and vi) providing a hard mask formed to correspond to the removed first outer periphery, positioned on the substrate, and spaced apart from the light reflecting portion to surround the light reflecting portion.


Find Patent Forward Citations

Loading…