The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2025

Filed:

Jun. 24, 2022
Applicants:

Chengdu Boe Optoelectronics Technology Co., Ltd., Sichuan, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Ting Li, Beijing, CN;

Zhengdong Zhang, Beijing, CN;

Pengcheng Zang, Beijing, CN;

Yadong Zhang, Beijing, CN;

Zheng Liao, Beijing, CN;

Ze Zhao, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G09G 5/00 (2006.01); G09G 3/36 (2006.01); H10D 86/40 (2025.01); H10D 86/60 (2025.01); G02F 1/1362 (2006.01);
U.S. Cl.
CPC ...
H10D 86/60 (2025.01); G09G 3/3648 (2013.01); H10D 86/441 (2025.01); G02F 1/136286 (2013.01); G09G 2300/0426 (2013.01); G09G 2320/0223 (2013.01);
Abstract

A display substrate and a display device are provided. The display substrate includes a base substrate, sub-pixels, signal lines and signal line connection lines. The base substrate includes a first region and a second region, and a number of the sub-pixels along a first direction in the first region is larger than a number of the sub-pixels along the first direction in the second region. The signal line connection lines are electrically connected with the signal lines located in the second region. The display substrate further includes overlapping traces disposed at intervals and located in a layer different from that of the signal line connection lines. An orthographic projection of at least one of the signal line connection lines on the base substrate is completely within an orthographic projection of at least one of the overlapping traces on the base substrate.


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