The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2025

Filed:

Aug. 22, 2022
Applicant:

Fuji Electric Co., Ltd., Kanagawa, JP;

Inventors:

Koh Yoshikawa, Matsumoto, JP;

Kosuke Yoshida, Matsumoto, JP;

Nao Suganuma, Matsumoto, JP;

Assignee:

FUJI ELECTRIC CO., LTD., Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/40 (2006.01); H01L 21/02 (2006.01); H01L 27/06 (2006.01); H01L 29/06 (2006.01); H01L 29/10 (2006.01); H01L 29/739 (2006.01); H10D 12/00 (2025.01); H10D 62/10 (2025.01); H10D 62/17 (2025.01); H10D 64/00 (2025.01); H10D 84/60 (2025.01);
U.S. Cl.
CPC ...
H10D 64/118 (2025.01); H01L 21/02236 (2013.01); H01L 21/02255 (2013.01); H10D 12/481 (2025.01); H10D 62/107 (2025.01); H10D 62/393 (2025.01); H10D 64/111 (2025.01); H10D 84/617 (2025.01);
Abstract

Provided is a semiconductor device including a semiconductor substrate having a first dopant of a first conductivity type and a second dopant of a second conductivity type, both the first dopant and the second dopant being distributed in an entire part of the semiconductor substrate, the semiconductor substrate including a drift region of the first conductivity type, a dielectric film provided on an upper surface of the semiconductor substrate, a high concentration region of the first conductivity type provided in contact with the dielectric film below the dielectric film and having a higher doping concentration than the drift region, and a fall off region that is provided in contact with the dielectric film below the dielectric film and in which a concentration of the dopant of the second conductivity type decreases toward the dielectric film.


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