The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2025

Filed:

May. 10, 2023
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Seungmin Song, Suwon-si, KR;

Myungil Kang, Suwon-si, KR;

Hyojin Kim, Suwon-si, KR;

Doyoung Choi, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/67 (2025.01); H01L 23/528 (2006.01); H10D 30/43 (2025.01); H10D 62/10 (2025.01); H10D 64/23 (2025.01); H10D 84/85 (2025.01);
U.S. Cl.
CPC ...
H10D 30/6735 (2025.01); H01L 23/5283 (2013.01); H10D 30/43 (2025.01); H10D 30/6757 (2025.01); H10D 62/121 (2025.01); H10D 64/258 (2025.01); H10D 84/85 (2025.01);
Abstract

A semiconductor device includes an active region on a substrate; channel layers on the active region spaced apart from each other and including lower and upper channel layers; an intermediate insulating layer between an uppermost lower channel layer and a lowermost upper channel layer; a gate intersecting the active region and including a lower gate electrode surrounding the lower channel layers and an upper gate electrode surrounding the upper channel layers; an insulating pattern between the upper and lower gate electrodes on a side of the intermediate insulating layer; source/drain regions on at least one side of the gate, and including lower source/drain regions connected to the lower channel layers and upper source/drain regions connected to the upper channel layers; and a contact plug including a horizontal extension portion connected to the lower source/drain regions, and a vertical extension portion connected to the horizontal extension portion.


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