The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2025
Filed:
Jan. 18, 2023
Applicant:
Skyworks Solutions, Inc., Irvine, CA (US);
Inventors:
Guofeng Chen, Fremont, CA (US);
Yu Hui, Pleasanton, CA (US);
Assignee:
SKYWORKS SOLUTIONS, INC., Irvine, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04R 31/00 (2006.01); B81B 3/00 (2006.01); B81C 1/00 (2006.01); H04R 7/04 (2006.01); H04R 7/18 (2006.01); H04R 17/02 (2006.01); H04R 19/04 (2006.01);
U.S. Cl.
CPC ...
H04R 31/006 (2013.01); B81B 3/0072 (2013.01); B81C 1/00666 (2013.01); H04R 7/04 (2013.01); H04R 7/18 (2013.01); H04R 17/02 (2013.01); H04R 19/04 (2013.01); H04R 31/003 (2013.01); B81B 2201/0257 (2013.01); B81B 2203/0127 (2013.01); B81B 2203/0307 (2013.01); B81C 2201/0105 (2013.01); B81C 2201/0132 (2013.01); B81C 2203/0118 (2013.01); H04R 2201/003 (2013.01);
Abstract
A method for manufacturing a microelectromechanical systems (MEMS) microphone comprises depositing a membrane on a first sacrificial layer, wherein the first sacrificial layer is deposited on a substrate, etching the substrate to define a cavity, releasing the membrane by removing at least the first sacrificial layer, and forming at least one anchor at the edge of the membrane.