The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2025

Filed:

Nov. 30, 2023
Applicant:

Dongwoo Fine-chem Co., Ltd., Jeollabuk-do, KR;

Inventors:

Won Hee Lee, Jeollabuk-do, KR;

In Kak Song, Jeollabuk-do, KR;

So Eun Jang, Jeollabuk-do, KR;

Assignee:

DONGWOO FINE-CHEM CO., LTD., Jeollabuk-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01B 5/14 (2006.01); H01Q 1/22 (2006.01); H01Q 9/04 (2006.01);
U.S. Cl.
CPC ...
H01B 5/14 (2013.01); H01Q 1/2258 (2013.01); H01Q 9/0407 (2013.01);
Abstract

A conductive mesh structure includes a dielectric layer, a first mesh pattern disposed on a top surface of the dielectric layer and including conductive lines that intersect each other, a second mesh pattern disposed on the top surface of the dielectric layer and including dummy lines that intersect each other and segmented portions that cut portions of each of the dummy lines, and separation portions separating the first mesh pattern and the second mesh pattern. A ratio of a width of each of the separation portions to a width of each of the segmented portions is in a range from 0.7 to 1.6.


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