The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2025
Filed:
Sep. 20, 2022
Meta Platforms Technologies, Llc, Menlo Park, CA (US);
Junren Wang, Kirkland, WA (US);
Xiayu Feng, Kirkland, WA (US);
Mengfei Wang, Woodinville, WA (US);
Lu Lu, Kirkland, WA (US);
Meta Platforms Technologies, LLC, Menlo Park, CA (US);
Abstract
A method includes providing a radiation with a predetermined intensity profile. The method also includes providing a photo-sensitive medium layer including a mixture of a photo-sensitive material and an absorbing additive. The absorbing additive has a predetermined non-uniform distribution in at least one of a direction within a film plane or a thickness direction of the photo-sensitive medium layer. The predetermined non-uniform distribution of the absorbing additive is configured to result in a predetermined non-uniform absorption of the radiation. The method also includes exposing the photo-sensitive medium layer to the radiation to form a polymer film. The optical film includes at least one predetermined birefringence variation in at least one of a direction within a film plane or a thickness direction of the polymer film.