The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2025

Filed:

Mar. 07, 2022
Applicant:

Cubixel Co., Ltd., Seoul, KR;

Inventors:

Tae Geun Kim, Seoul, KR;

Seung Ram Lim, Seoul, KR;

Kyung Beom Kim, Seoul, KR;

Eung Joon Lee, Seoul, KR;

Dong Hwan Im, Seoul, KR;

Assignee:

CUBIXEL CO., LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/00 (2006.01); G02B 21/36 (2006.01); G03H 1/00 (2006.01);
U.S. Cl.
CPC ...
G02B 21/0044 (2013.01); G02B 21/0032 (2013.01); G02B 21/0056 (2013.01); G02B 21/006 (2013.01); G02B 21/364 (2013.01); G03H 1/0005 (2013.01); G03H 2001/005 (2013.01);
Abstract

A flying-over beam pattern scanning hologram microscope device includes: a scan beam generation unit which converts of a first beam and a second beam to a first spherical wave; a scanning unit, which includes a spatial modulation scanner for controlling the scan beam in the horizontal direction, and a translation stage for moving an object in the vertical direction at the rear end of the projection unit; the projection unit projecting the scan beam onto an object plane; and a light collection unit which detects a beam that has passed through the objective lens again after being reflected or fluoresced from the object.


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