The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2025
Filed:
May. 27, 2020
Basf SE, Ludwigshafen am Rhein, DE;
Wayne State University, Detroit, MI (US);
Sinja Verena Klenk, Ludwigshafen am Rhein, DE;
David Dominique Schweinfurth, Ludwigshafen am Rhein, DE;
Lukas Mayr, Ludwigshafen am Rhein, DE;
Sabine Weiguny, Ludwigshafen am Rhein, DE;
Charles Winter, Detroit, MI (US);
Nilanka Weerathunga Sirikkathuge, Detroit, MI (US);
Tharindu Karunaratne, Detroit, MI (US);
Abstract
The present invention is in the field of processes for preparing inorganic metal- or semimetal-containing films. The process comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate in contact with a compound of general formula (I), (II), or (III) in the gaseous state (I) (II) (III) wherein A is NR, NR, PR, PR, O, OR, S, or SR, E is N, NR, P, PR, O or S, n is 1, 2, or 3, R is an alkyl group, an alkenyl group, an aryl group, or a silyl group and R' is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group, and A, E, and n are chosen such that the compound of general formula (I), (II), or (III) is electronically neutral.