The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2025
Filed:
Sep. 08, 2023
Applicant:
Forge Nano Inc., Thornton, CO (US);
Inventors:
Joseph Allen Spencer, Ii, Longmont, CO (US);
Robert A. Hall, Denver, CO (US);
Assignee:
Forge Nano Inc., Thornton, CO (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/44 (2006.01); C23C 16/442 (2006.01); C23C 16/458 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45551 (2013.01); C23C 16/4417 (2013.01); C23C 16/442 (2013.01); C23C 16/45555 (2013.01); C23C 16/54 (2013.01); C23C 16/4408 (2013.01); C23C 16/45504 (2013.01); C23C 16/458 (2013.01);
Abstract
Continuous spatial atomic layer deposition is performed on a particulate substrate in a continuous reactor comprising a plurality of spatially separated, precursor dosing zones and a means for moving the particulate substrate spatially through the precursor dosing zones to apply an atomic layer deposition coating thereon. The precursor dosing zones may be used simultaneously.
Spencer, Ii, Joseph. (2025). Continuous spatial atomic layer deposition process and apparatus for applying films on particles (U.S. Patent No. 12492474). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12492474
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile