The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2025
Filed:
Mar. 22, 2021
Denka Company Limited, Tokyo, JP;
Hideharu Mori, Yonezawa, JP;
Wataru Nishino, Tokyo, JP;
Yushi Kumagai, Tokyo, JP;
Yutaka Saito, Tokyo, JP;
Naoki Kobayashi, Tokyo, JP;
DENKA COMPANY LIMITED, Tokyo, JP;
Abstract
A chloroprene-based block copolymer, a latex, a latex composition, and a rubber composition that can produce a product with excellent tensile properties and flexibility without the use of a vulcanizing agent or a vulcanizing accelerator having a chloroprene-based block copolymer, contains 5 to 30% by mass of a polymer block (A) and 70 to 95% by mass of a chloroprene-based polymer block (B), wherein the polymer block (A) is derived from a monomer, when the monomer is polymerized alone, a polymer with a glass transition temperature of 80° C. or higher can be obtained and the chloroprene-based polymer block (B) includes a chloroprene monomer unit and a polyfunctional monomer unit.