The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2025

Filed:

May. 03, 2022
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Yosuke Murakami, Tochigi, JP;

Kazuki Nakagawa, Tochigi, JP;

Masahiro Tamura, Tochigi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 59/02 (2006.01); B29C 37/00 (2006.01); B29C 59/00 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
B29C 59/02 (2013.01); B29C 59/002 (2013.01); G03F 7/0002 (2013.01);
Abstract

In order to provide an imprint device and the like that can efficiently maintain a concentration of a gas when imprinting is sequentially performed, the imprint device includes: a mold holding unit configured to a mold; a substrate holding unit configured to holding a substrate; a gas supply unit configured to supply a gas to an imprint space between the mold and the substrate; and a control unit configured to control the gas supply unit and an imprinting operation, wherein the control unit is configured to sequentially perform imprinting on a plurality of imprint regions of the substrate, and the control unit is configured to, when a moving direction of the substrate between the imprint regions is changed from a first direction to a second direction, supply a gas to the imprint space in the first direction and the second direction using the gas supply unit during the imprinting operation on the imprint region before the change in the moving direction.


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