The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2025
Filed:
Jun. 23, 2020
Jsw Aktina System Co., Ltd., Yokohama, JP;
Kenichi Ohmori, Tokyo, JP;
Suk-Hwan Chung, Tokyo, JP;
Ryosuke Sato, Tokyo, JP;
Yuzaburo Ota, Tokyo, JP;
JSW Aktina System Co., Ltd., Yokohama, JP;
Abstract
A laser processing device and a laser processing method that are capable of forming a high-quality semiconductor film are provided. An ELA device (excimer laser annealing device) () includes a laser oscillator () that generates laser light for forming a polysilicon film by irradiating an amorphous silicon film over a substrate to be processed with the laser light, a pulse measuring instrument () for detecting first partial light and second partial light contained in the laser light, and a monitoring device () for comparing a detection result of the first partial light with a detection result of the second partial light.