The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2025

Filed:

Sep. 07, 2021
Applicant:

Innoscience (Suzhou) Technology Co., Ltd., Suzhou, CN;

Inventors:

Ronghui Hao, Suzhou, CN;

Chuan He, Suzhou, CN;

King Yuen Wong, Suzhou, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/00 (2025.01); H01L 21/225 (2006.01); H10D 30/01 (2025.01); H10D 30/47 (2025.01); H10D 62/13 (2025.01); H10D 62/85 (2025.01); H10D 64/62 (2025.01);
U.S. Cl.
CPC ...
H10D 62/149 (2025.01); H01L 21/2258 (2013.01); H10D 30/015 (2025.01); H10D 30/475 (2025.01); H10D 62/85 (2025.01); H10D 64/62 (2025.01); H10D 62/8503 (2025.01);
Abstract

A semiconductor device includes a first and a second nitride-based semiconductor layers, a first p-type doped nitride-based semiconductor layer, a first and a second electrodes. The first p-type doped nitride-based semiconductor layer is disposed above the second nitride-based semiconductor layer and has a bottom surface in contact with the second nitride-based semiconductor layer. The first p-type doped nitride-based semiconductor layer has a hydrogen concentration which decrementally decreases along a direction pointing from the bottom surface toward a top surface of the first p-type doped nitride-based semiconductor layer. The first electrode is disposed on the first p-type doped nitride-based semiconductor layer and in contact with the top surface of the first p-type doped nitride-based semiconductor layer. The second electrode is disposed above the second nitride-based semiconductor layer to define a drift region.


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