The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2025

Filed:

Dec. 05, 2022
Applicant:

Xiamen Tianma Display Technology Co., Ltd., Xiamen, CN;

Inventors:

Jun Tanaka, Kanagawa, JP;

Kazushige Takechi, Kanagawa, JP;

Kenji Sera, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/42 (2006.01); H01L 21/426 (2006.01); H10D 30/67 (2025.01); H10D 99/00 (2025.01); H10K 59/12 (2023.01); H10K 59/121 (2023.01);
U.S. Cl.
CPC ...
H10D 30/6755 (2025.01); H01L 21/426 (2013.01); H10D 30/6713 (2025.01); H10D 30/6734 (2025.01); H10D 30/6757 (2025.01); H10D 99/00 (2025.01); H10K 59/1213 (2023.02);
Abstract

An oxide semiconductor thin-film transistor device includes a gate electrode region, an oxide semiconductor region, a first source/drain electrode region, and a second source/drain electrode region. The oxide semiconductor region has a concentration distribution of an element capable of increasing resistance of an oxide semiconductor. The concentration distribution shows a first concentration at the centroid of a channel region overlapping the gate electrode region in a planar view. The concentration distribution shows a concentration higher than the first concentration in a vicinity of at least a part of a boundary defining an outer end of the channel region.


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