The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2025

Filed:

Jun. 15, 2021
Applicant:

Suzhou Institute of Biomedical Engineering and Technology, Chinese Academy of Sciences, Suzhou, CN;

Inventors:

Yi He, Suzhou, CN;

Yiwei Chen, Suzhou, CN;

Lina Xing, Suzhou, CN;

Wen Kong, Suzhou, CN;

Guohua Shi, Suzhou, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 5/80 (2024.01); A61B 3/12 (2006.01); G02B 26/10 (2006.01); G02B 27/00 (2006.01);
U.S. Cl.
CPC ...
G06T 5/80 (2024.01); A61B 3/12 (2013.01); G02B 26/105 (2013.01); G02B 27/0031 (2013.01);
Abstract

An anisoplanatic aberration correction method and apparatus for adaptive optical linear beam scanning imaging. The method comprises: in an adaptive optical linear beam scanning imaging system, performing temporal correction on an anisoplanatic region aberration in a linear beam scanning direction, and performing regional correction on an anisoplanatic region aberration in a linear beam direction. According to the method, the limitation of an isoplanatic region on an adaptive optical imaging field of view can be overcome, and wide field of view aberration correction and high-resolution imaging of a retina is realized. According to the provided method and apparatus for temporal and regional correction of a wide field of view anisoplanatic aberration, the wide field of view aberration correction can be completed by means of only a single wavefront sensor and a single wavefront corrector, such that almost none of the system complexities is increased.


Find Patent Forward Citations

Loading…