The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2025

Filed:

Jun. 03, 2022
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Myung Hwan Oh, Gyeonggi-do, KR;

Sung Yong Lee, Gyeonggi-do, KR;

Dong Hyuk Seo, Gyeonggi-do, KR;

Young Un Yun, Chungcheongnam-do, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/40 (2006.01); G03F 7/00 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); G03F 7/38 (2013.01); G03F 7/70875 (2013.01);
Abstract

The present invention provides a method of treating a substrate, the method including: performing a first heating process of heat-treating the substrate formed with a film, and a second heating process of heat-treating the substrate after the first heating process is performed; a collection operation of collecting temperature data of a first heating plate which heats the substrate in the first heating process; and a first control operation of adjusting a temperature of a second heating plate which heats the substrate in the second heating process based on the temperature data.


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