The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2025
Filed:
Aug. 23, 2021
Canon Kabushiki Kaisha, Tokyo, JP;
Masato Homma, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposing apparatus for exposing a substrate to transfer a pattern formed on an original to the substrate by using exposure light from a light source includes a projecting optical system configured to guide the exposure light having passed through the original to the substrate, a measuring unit configured to measure a position of the substrate in a first direction perpendicular to a substrate surface of the substrate by making measurement light incident on the substrate surface and to receive the measurement light reflected by the substrate surface, and a traveling direction setting means configured to set a traveling direction of first gas so as to supply the first gas toward a first space between the projecting optical system and the substrate from a first gas supplying mechanism, in which the first space is different from a second space through which the measurement light passes.