The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2025

Filed:

Aug. 03, 2022
Applicant:

Sumitomo Chemical Company, Limited, Tokyo, JP;

Inventors:

Hiromu Nakamura, Osaka, JP;

Koji Ichikawa, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08F 212/14 (2006.01); C08F 220/06 (2006.01); C08F 220/28 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C08F 212/24 (2020.02); C08F 220/06 (2013.01); C08F 220/281 (2020.02); C08F 220/282 (2020.02); G03F 7/038 (2013.01);
Abstract

A resist composition includes (A1) a resin including a structural unit represented by formula (I) and a structural unit represented by formula (II), and no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein Rand Reach represent a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom, Xand Xeach represent a single bond or *—CO—O—, Lrepresents a single bond or a hydrocarbon group which may have a substituent, and —CH— included in the group may be replaced by —O—, —S—, —SO— or —CO—, ring W represents a hydrocarbon ring which may have a substituent, mi and mk represent an integer of 1 to 4, and Lrepresents a single bond or a hydrocarbon group which may have a substituent, and —CH— included in the group may be replaced by —O—, —S—, —SO— or —CO—.


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