The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2025
Filed:
Aug. 30, 2021
Applicant:
Soulbrain Co., Ltd., Seongnam-si, KR;
Inventors:
Jeong Ho Lee, Seongnam-si, KR;
Seok Joo Kim, Seongnam-si, KR;
Assignee:
SOULBRAIN CO., LTD., Seongnam-si, KR;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C01F 17/235 (2020.01); C09K 3/14 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C01F 17/235 (2020.01); C09K 3/1409 (2013.01); H01L 21/30625 (2013.01); C01P 2002/72 (2013.01); C01P 2002/74 (2013.01); C01P 2002/82 (2013.01); C01P 2002/84 (2013.01); C01P 2002/85 (2013.01); C01P 2002/90 (2013.01); C01P 2004/03 (2013.01); C01P 2004/04 (2013.01); C01P 2004/64 (2013.01); C01P 2006/22 (2013.01); C01P 2006/60 (2013.01);
Abstract
Proposed are cerium oxide particles for chemical mechanical polishing and a slurry composition for chemical mechanical polishing comprising the same. The surfaces of the cerium oxide particles comprise Ceand Ce. When the cerium oxide particles are used, they may exhibit a high oxide removal rate and high oxide selectivity in a low particle content range despite their fine particle size as a result of increasing the proportion of Ceon the cerium oxide surface.