The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2025

Filed:

Jan. 22, 2021
Applicant:

Kanto Denka Kogyo Co., Ltd., Tokyo, JP;

Inventors:

Ryo Kimura, Gunma, JP;

Akiko Nakanishi, Tokyo, JP;

Shohei Maehara, Gunma, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 51/64 (2006.01);
U.S. Cl.
CPC ...
C07C 51/64 (2013.01);
Abstract

An object is to prevent lowering in the yield of R—COF due to contamination by impurities and thereby to produce a high-purity product of R—COF in a stable manner. According to the present invention, provided are: a method of purifying a carboxylic acid fluoride, comprising a step of removing a hydrogen halide by bringing a carboxylic acid fluoride containing the hydrogen halide into contact with a metal fluoride; a method of producing a high-purity carboxylic acid fluoride, comprising a step of bringing a carboxylic acid fluoride containing a hydrogen halide into contact with a metal fluoride as well as a high-purity carboxylic acid fluoride obtained therefrom; and a method of using a metal fluoride as an adsorbent for a hydrogen halide in a method of removing a hydrogen halide from a carboxylic acid fluoride containing the hydrogen halide.


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