The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2025

Filed:

Aug. 23, 2022
Applicant:

Stmicroelectronics S.r.l., Agrate Brianza, IT;

Inventors:

Paolo Ferrari, Gallarate, IT;

Flavio Francesco Villa, Milan, IT;

Roberto Campedelli, Novate Milanese, IT;

Luca Lamagna, Cassina de' Pecchi, IT;

Enri Duqi, Milan, IT;

Mikel Azpeitia Urquia, Milan, IT;

Silvia Nicoli, Casatenovo, IT;

Maria Carolina Turi, Milan, IT;

Assignee:

STMICROELECTRONICS S.r.l., Agrate Brianza, IT;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B81C 1/00 (2006.01); G01L 9/00 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00285 (2013.01); G01L 9/0073 (2013.01); B81B 2201/0264 (2013.01);
Abstract

The present disclosure is directed to a method for manufacturing a micro-electro-mechanical device. The method includes the steps of forming, on a substrate, a first protection layer of crystallized aluminum oxide, impermeable to HF; forming, on the first protection layer, a sacrificial layer of silicon oxide removable with HF; forming, on the sacrificial layer, a second protection layer of crystallized aluminum oxide; exposing a sacrificial portion of the sacrificial layer; forming, on the sacrificial portion, a first membrane layer of a porous material, permeable to HF; forming a cavity by removing the sacrificial portion through the first membrane layer; and sealing pores of the first membrane layer by forming a second membrane layer on the first membrane layer.


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