The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2025
Filed:
Sep. 21, 2020
Ecole Polytechnique Federale DE Lausanne (Epfl), Lausanne, CH;
ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL), Lausanne, CH;
Abstract
The present invention is related to a method of digitally compensating distortions of rays of a light beam in tomography-based additive manufacturing, wherein said tomography-based additive manufacturing involves projecting light patterns from multiple angles into a container () comprising photoresponsive material, by simulating the path of the light rays through the container () and the photoresponsive material; and digitally compensating the light projections based on the simulated path of the light rays, so as to obtain modified light projections. The present invention is also related to a method and apparatus for preparing an object () in tomography-based additive manufacturing, employing said distortion compensation method.