The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2025
Filed:
Jul. 14, 2022
Screen Holdings Co., Ltd., Kyoto, JP;
Nobuaki Okita, Kyoto, JP;
Junichi Ishii, Kyoto, JP;
Kazuki Nakamura, Kyoto, JP;
Takashi Shinohara, Kyoto, JP;
Yoshifumi Okada, Kyoto, JP;
Tomoyuki Shinohara, Kyoto, JP;
Takuma Takahashi, Kyoto, JP;
SCREEN HOLDINGS CO., LTD., , JP;
Abstract
An upper holding device holds a substrate in a horizontal attitude without rotating the substrate. A lower holding device rotates a substrate while holding the substrate by suction. A substrate held by the upper holding device is cleaned with use of a cleaning liquid, and a substrate held by the lower holding device is cleaned with use of a cleaning liquid. Gas in a processing space is exhausted by exhaust equipment of a factory through an exhaust system. When a substrate is held by the upper holding device, gas in the processing space is not exhausted or gas in the processing space is exhausted at a first flow rate. Gas in the processing space is exhausted at a second or third flow rate that is higher than the first flow rate when the substrate is held by the lower holding device.