Discharge device for a reaction vessel unit, centrifuge and method for cleaning a reaction vessel unit

Abstract

The invention relates to a discharge device () for a reaction vessel unit () which has a plurality of reaction vessels (), wherein the reaction vessels () each have an opening () which lie in a common opening plane (), wherein the discharge device () has a discharge plate () which is designed in such a way that it can be arranged or is arranged opposite the openings () of the reaction vessels () in a centrifuge () and is designed such that it rotates with the reaction vessel unit () during centrifuging and liquid escaping from the reaction vessels () is collected and drained off by the discharge plate () due to the centrifugal acceleration. The invention also relates to a centrifuge () for cleaning a reaction vessel unit (), having a drive, a rotor () which can be coupled or is coupled to the drive, wherein the rotor () is designed to receive the reaction vessel unit () with the discharge device (). The invention further relates to a method for cleaning a reaction vessel unit (), wherein the reaction vessel unit () is received on a rotor () of the centrifuge () with its openings () facing outwards from a rotation axis () of the rotor (); and the rotor () with the reaction vessel unit () arranged thereon is rotated in the centrifuge (), so that a liquid contained in the reaction vessels () is ejected, and wherein the ejected liquid is collected by a discharge device () with a discharge plate (), which is arranged radially opposite the opening plane () of the reaction vessels () and rotates together with the reaction vessel unit (), and is discharged along the discharge plate ().