The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 02, 2025

Filed:

Jul. 05, 2023
Applicant:

Korea University Research and Business Foundation, Seoul, KR;

Inventors:

Seung-Kwan Hong, Yongin-si, KR;

Seon-Kyu Lee, Seoul, KR;

Jung-Hyun Kim, Gunpo-si, KR;

Yeo-Jin Shin, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/22 (2006.01); B01D 19/00 (2006.01); B01D 65/08 (2006.01); B01D 69/02 (2006.01); C02F 1/20 (2023.01); C02F 1/46 (2023.01); C02F 1/467 (2023.01); C02F 101/32 (2006.01);
U.S. Cl.
CPC ...
B01D 19/0073 (2013.01); B01D 19/0031 (2013.01); B01D 65/08 (2013.01); B01D 69/02 (2013.01); C02F 1/20 (2013.01); C02F 1/4602 (2013.01); C02F 1/4672 (2013.01); B01D 2321/18 (2013.01); B01D 2321/22 (2013.01); B01D 2325/26 (2013.01); C02F 2101/32 (2013.01); C02F 2305/023 (2013.01);
Abstract

Disclosure relates to an electrochemical membrane degassing apparatus including a liquid channel in which raw water flows, a gaseous channel in which gas degassed from the raw water flows, a gas separation membrane allowing gas in the raw water to be moved to the gaseous channel, a surface modification layer formed at the gas separation membrane, and a power supply unit applying power to the surface modification layer, and selectively operated in either of a first process mode applying a low voltage power and a second process mode applying a high voltage power, wherein in the first process mode, an electrostatic repulsive force is generated between the surface modification layer and organic particles, and in the second process mode, a radical is generated, and the organic particles is oxidized by the radical. Accordingly, the efficiency of membrane degassing can be improved and membrane contamination can be prevented.


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