The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2025

Filed:

Jul. 28, 2022
Applicant:

The University of Tokyo, Tokyo, JP;

Inventors:

Leo Miyashita, Tokyo, JP;

Satoshi Tabata, Tokyo, JP;

Masatoshi Ishikawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 5/74 (2006.01); G06T 5/80 (2024.01); G06T 11/60 (2006.01);
U.S. Cl.
CPC ...
H04N 5/74 (2013.01); G06T 5/80 (2024.01); G06T 11/60 (2013.01);
Abstract

[Problem] To provide an information processing device, program, and pattern code that make it possible to quickly specify a position in a pattern. [Solution] In one embodiment of this invention, an information processing device is provided. The information processing device comprises a projection image generation unit, a decryption unit, and a phase specification unit. The projection image generation unit is configured so as to be capable of generating a projection image on the basis of predetermined pattern information and outputting the generated projection image to a projection device. The projection image comprises a clock pattern and a data pattern based on pattern information. The decryption unit is configured so as to be capable of decrypting the data pattern into values on the basis of a captured image obtained by imaging an object using an imaging device. The captured image is an image obtained by photographing the object when the projection image is being projected thereon by the projection device. The phase specification unit is configured so as to be capable of specifying the phases of each part of the object on the basis of the values and pattern information.


Find Patent Forward Citations

Loading…