The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2025
Filed:
Dec. 31, 2022
Samsung Electronics Co., Ltd., Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A manufacturing method of a semiconductor device includes: etching a substrate, thereby forming a cell trench and a dummy trench; forming a preliminary isolation structure on the substrate, wherein a first dummy recess is formed in the preliminary isolation structure and overlaps with the dummy trench; forming a lower mask layer on the preliminary isolation structure, wherein a second dummy recess is formed in the lower mask layer and overlaps with the first dummy recess; forming a dummy recess filling pattern filling the second dummy recess; forming an upper mask layer on the lower mask layer and the dummy recess filling pattern; forming a gate trench using the lower mask layer and the upper mask layer as a mask; and forming a gate structure in the gate trench.