The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2025
Filed:
Mar. 18, 2025
The Hong Kong University of Science and Technology (Guangzhou), Guangdong, CN;
Wei Xu, Guangdong, CN;
Yijie Li, Guangdong, CN;
Xiangjun Zeng, Guangdong, CN;
Ji Li, Guangdong, CN;
Nina Wang, Guangdong, CN;
Xuemeng Feng, Guangdong, CN;
THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (GUANGZHOU), Guangzhou, CN;
Abstract
A research wet etching fully automatic system includes: a machine system for providing a miniaturized machine chamber; an etching system including chemical solution modules in the miniaturized machine chamber, the chemical solution module including a chemical solution tank and a chemical solution supply mechanism for supplying a chemical solution to the chemical solution tank according to a preset chemical solution supply strategy and controlling an etching environment in the chemical solution tank; a feeding system for implementing automatic transportation of a workpiece; a robot system including a robot module and a vision module communicatively connected thereto; and a control system. The robot module is internally arranged at a top of the working space, and is configured for gripping the workpiece according to image information fed back by the vision module, and placing the workpiece into the chemical solution tank for etching according to a preset etching strategy.