The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2025
Filed:
Oct. 25, 2023
Zhejiang University, Zhejiang, CN;
ZHEJIANG UNIVERSITY, Hangzhou, CN;
Abstract
A freestyle acquisition method for a high-dimensional material, belonging to the field of computer graphics and computer vision. The learning of material information is transformed into a geometric learning problem on an unstructured point cloud, and a plurality of acquisition results in different lighting and view directions form a high-dimensional point cloud, each point in the point cloud being a vector formed by an image measurement value and pose information of an object during image capture. According to the method, information of unstructured views can be effectively aggregated from the high-dimensional point cloud which is disordered, irregular, uneven in distribution and limited in precision, and the material attribute with high quality is reconstructed.