The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2025
Filed:
Jul. 02, 2023
Army Academy of Armored Forces of Pla, Beijing, CN;
Xingpeng Yan, Beijing, CN;
Xinlei Liu, Beijing, CN;
Xiaoyu Jiang, Beijing, CN;
Xi Wang, Beijing, CN;
Tao Jing, Beijing, CN;
Cheng Song, Beijing, CN;
Junhui Liu, Beijing, CN;
ARMY ACADEMY OF ARMORED FORCES OF PLA, Beijing, CN;
Abstract
A method and system for optimizing first-diffraction-order reconstruction of holograms, a device, and a medium are provided. The method includes: acquiring a target image; determining a target image light field according to the target image; calculating a target diffraction field for the target image light field by performing backward propagation by a set distance; constructing a U-Net network model; and inputting the target diffraction field into a trained U-Net network model to acquire an optimized hologram. The trained U-Net network model is obtained by constructing a U-Net network model and training and optimizing the U-Net network model, thereby continuously improving the quality of the zero-diffraction-order reconstructed image of the initial hologram and finally achieving the effect of optimizing the first-diffraction-order reconstructed image of the hologram.