The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2025

Filed:

Jan. 17, 2023
Applicant:

Hitachi High-tech Corporation, Tokyo, JP;

Inventors:

Takeshi Morimoto, Tokyo, JP;

Momoyo Enyama, Tokyo, JP;

Akira Ikegami, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/00 (2006.01); G02B 21/36 (2006.01);
U.S. Cl.
CPC ...
G02B 21/0076 (2013.01); G02B 21/0072 (2013.01); G02B 21/361 (2013.01);
Abstract

A photoelectron emission microscope reducing preparation time for capturing a photoelectron image with high luminance and resolution. The photoelectron emission microscope includes: a sample stage on which a sample is to be placed; an excitation light source configured to irradiate the sample with excitation light; a camera configured to detect photoelectrons emitted from the sample and capture a photoelectron image; an objective lens configured to focus the photoelectrons on a detection surface of the camera; and a control unit configured to control each unit, in which the control unit aligns, based on a luminance distribution of a first photoelectron image, a field-of-view center of the camera with an irradiation position of the excitation light, and aligns, based on a second photoelectron image and a third photoelectron image that are captured by changing a lens intensity of the objective lens, the field-of-view center with a central axis of the objective lens.


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