The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2025
Filed:
Jun. 05, 2023
Applicant:
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Inventor:
Chikao Ikenaga, Tokyo, JP;
Assignee:
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); C23C 14/04 (2006.01); G06T 7/00 (2017.01); H10K 71/16 (2023.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); G03F 7/0015 (2013.01); G06T 7/0006 (2013.01); H10K 71/164 (2023.02); H10K 71/166 (2023.02); G06T 2207/30108 (2013.01);
Abstract
A method of quality determination of a deposition mask according to the present disclosure includes: a measuring step that measures a dimension X1 from a P1 point to a Q1 point, and a dimension X2 from a P2 point to a Q2 point; and a determining step that determines a quality of a deposition mask, based on the dimension X1 and the dimension X2 measured in the measuring step.
Ikenaga, Chikao. (2025). Method of quality determining of deposition mask, method of manufacturing deposition mask, method of manufacturing deposition mask device, method of selecting deposition mask, and deposition mask (U.S. Patent No. 12480200). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12480200
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