The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2025

Filed:

Apr. 06, 2022
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Kengo Kanazaki, Kanagawa, JP;

Fumio Yamauchi, Kanagawa, JP;

Motokazu Kobayashi, Kanagawa, JP;

Norishige Kakegawa, Tokyo, JP;

Ryo Natori, Tokyo, JP;

Tetsushi Yamamoto, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 25/14 (2006.01); C08F 212/08 (2006.01); G01N 33/545 (2006.01);
U.S. Cl.
CPC ...
C08L 25/14 (2013.01); C08F 212/08 (2013.01); G01N 33/545 (2013.01);
Abstract

To provide a method for producing a particle that can suppress non-specific adsorption without using BSA. A method for producing a particle, including: a first step of mixing a radically polymerizable monomer, an organic silane compound having a silicon atom to which an alkoxy group is bonded and having radical polymerizability, a radical polymerization initiator, a water-soluble polymer, and an aqueous medium to prepare an emulsion; and a second step of adding a specific reactive compound after the first step.


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