The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2025
Filed:
Sep. 30, 2020
Applicant:
Kuraray Noritake Dental Inc., Kurashiki, JP;
Inventors:
Kenji Suzuki, Niigata, JP;
Misaki Ito, Niigata, JP;
Assignee:
KURARAY NORITAKE DENTAL INC., Kurashiki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/46 (2006.01); A61C 7/08 (2006.01); A61K 6/887 (2020.01); B29C 64/124 (2017.01); B33Y 10/00 (2015.01); B33Y 70/00 (2020.01); B33Y 80/00 (2015.01); C08F 2/50 (2006.01); C08F 283/00 (2006.01); C08G 61/04 (2006.01); B29K 75/00 (2006.01);
U.S. Cl.
CPC ...
B29C 64/124 (2017.08); A61C 7/08 (2013.01); A61K 6/887 (2020.01); B33Y 10/00 (2014.12); B33Y 70/00 (2014.12); B33Y 80/00 (2014.12); C08F 2/50 (2013.01); C08F 283/008 (2013.01); B29K 2075/00 (2013.01);
Abstract
The present invention provides a resin composition for stereolithography that enables easy stereolithographical fabrication; and that can produce a cured object having desirable strain recovery, desirable toughness, and desirable water resistance. The present invention relates to a resin composition for stereolithography comprising a polymerizable compound (A) whose homopolymer has a glass transition temperature (Tg) of 37° C. or higher; and a photopolymerization initiator (B), and having a tan δ at 37° C. of 0.3 or less after cure.