logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12479153 B1

PDFFull Text
Date of Patent:
Nov. 25, 2025

Filed:

Sep. 30, 2020

Resin composition for stereolithography

Applicant:

Kuraray Noritake Dental Inc., Kurashiki, JP;

Inventors:

Kenji Suzuki, Niigata, JP;

Misaki Ito, Niigata, JP;

Assignee:

KURARAY NORITAKE DENTAL INC., Kurashiki, JP;

Attorney:

Element IP, PLC

Primary Examiner:

Jessica Whiteley

Int. Cl.
CPC ...
C08F 2/46 (2006.01); A61C 7/08 (2006.01); A61K 6/887 (2020.01); B29C 64/124 (2017.01); B33Y 10/00 (2015.01); B33Y 70/00 (2020.01); B33Y 80/00 (2015.01); C08F 2/50 (2006.01); C08F 283/00 (2006.01); C08G 61/04 (2006.01); B29K 75/00 (2006.01);
U.S. Cl.
CPC ...
B29C 64/124 (2017.08); A61C 7/08 (2013.01); A61K 6/887 (2020.01); B33Y 10/00 (2014.12); B33Y 70/00 (2014.12); B33Y 80/00 (2014.12); C08F 2/50 (2013.01); C08F 283/008 (2013.01); B29K 2075/00 (2013.01);
Abstract

The present invention provides a resin composition for stereolithography that enables easy stereolithographical fabrication; and that can produce a cured object having desirable strain recovery, desirable toughness, and desirable water resistance. The present invention relates to a resin composition for stereolithography comprising a polymerizable compound (A) whose homopolymer has a glass transition temperature (Tg) of 37° C. or higher; and a photopolymerization initiator (B), and having a tan δ at 37° C. of 0.3 or less after cure.

Find Patent Forward Citations

Suzuki, Kenji. (2025). Resin composition for stereolithography (U.S. Patent No. 12479153). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12479153

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…