The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2025

Filed:

Oct. 07, 2020
Applicant:

Siemens Energy Global Gmbh & Co. KG, Bayern, DE;

Inventors:

Jan Pascal Bogner, Berlin, DE;

Simon Purschke, Berlin, DE;

Julius Schurb, Berlin, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B33Y 10/00 (2015.01); B22F 10/28 (2021.01); B22F 10/366 (2021.01); B23K 15/00 (2006.01); B23K 26/0622 (2014.01); B23K 26/342 (2014.01);
U.S. Cl.
CPC ...
B22F 10/366 (2021.01); B22F 10/28 (2021.01); B23K 15/0086 (2013.01); B23K 26/0622 (2015.10); B23K 26/342 (2015.10); B33Y 10/00 (2014.12);
Abstract

A method for selectively irradiating a powder layer in additive manufacturing of a component. The method including: determining an irradiation pattern of the layer for additive manufacturing, wherein a first partial pattern is defined which is intended for continuous irradiation and comprises a plurality of irradiation vectors and wherein a second partial pattern is defined, which is intended for a pulsed irradiation, with the first and the second partial pattern being selected in such a manner that the second partial pattern connects irradiation vectors of the first partial pattern, and irradiating the layer in accordance with the irradiation patterns defined. A computer program product, an irradiating device, and a control unit for controlling an irradiating device are included.


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