The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 25, 2025

Filed:

Mar. 25, 2024
Applicant:

Quintus Technologies Ab, Vasteras, SE;

Inventors:

Per Burstrom, Vasteras, SE;

Emil Holmstrom, Vasteras, SE;

Assignee:

Quintus Technologies AB, Vasteras, SE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 3/15 (2006.01); B30B 11/00 (2006.01); B30B 15/26 (2006.01); B30B 15/34 (2006.01);
U.S. Cl.
CPC ...
B22F 3/15 (2013.01); B30B 11/002 (2013.01); B30B 11/005 (2013.01); B30B 15/26 (2013.01); B30B 15/34 (2013.01); B22F 2003/153 (2013.01); B22F 2203/11 (2013.01); B22F 2203/13 (2013.01);
Abstract

A method in a pressing arrangement is disclosed. The pressing arrangement comprises a pressure vessel arranged to hold pressure medium therein during use of the pressing arrangement, the pressure vessel including a treatment region therein, wherein the treatment region is arranged to accommodate at least one article. The pressing arrangement comprises at least one controllable pressure medium supplying device configured to transport pressure medium during a cooling phase from another region in the pressing arrangement to the treatment region, wherein the temperature of the pressure medium in the other region is lower than the temperature of the pressure medium in the treatment region during at least part of the cooling phase. The method includes adjusting at least one operational parameter of the at least one controllable pressure medium supplying device, to adjust the pressure medium supplying rate thereof.


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