The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2025

Filed:

Mar. 10, 2021
Applicants:

Chengdu Boe Optoelectronics Technology Co., Ltd., Sichuan, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Zhe Xu, Beijing, CN;

Wenxuan Zhang, Beijing, CN;

Fei You, Beijing, CN;

Fei Liao, Beijing, CN;

Ce Li, Beijing, CN;

Long Jiang, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10K 59/122 (2023.01); C23C 14/04 (2006.01); G03F 1/26 (2012.01); H10K 59/12 (2023.01); H10K 71/00 (2023.01);
U.S. Cl.
CPC ...
H10K 59/122 (2023.02); C23C 14/042 (2013.01); G03F 1/26 (2013.01); H10K 59/1201 (2023.02); H10K 71/00 (2023.02);
Abstract

A mask plate is used for manufacturing a pixel definition layer of the display substrate, which includes first transparent patterns and first opaque patterns, and further includes transition structures located between the first transparent patterns and the first opaque patterns. And the transition structures include a plurality of second transparent patterns and second opaque patterns alternately arranged, and a line width of each of the second transparent patterns and each of the second opaque patterns is less than the resolution of an exposure machine by using the mask plate for exposure.


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