The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2025
Filed:
Aug. 03, 2021
Ntt, Inc., Tokyo, JP;
Riku Omiya, Musashino, JP;
Masashi Iwabuchi, Musashino, JP;
Tomoaki Ogawa, Musashino, JP;
Yasushi Takatori, Musashino, JP;
NTT, Inc., Tokyo, JP;
Abstract
A reflection characteristic analysis device analyzes reflection characteristics of a reconfigurable intelligent surface (RIS: Reconfigurable Intelligent Surface). The reflection characteristic analysis device includes a ray trace calculation unit and an electromagnetic field analysis unit. The ray trace calculation unit calculates an incident angle of an electromagnetic wave incident on the reconfigurable intelligent surface by a ray-tracing method. The electromagnetic field analysis unit acquires the incident angle calculated by the ray trace calculation unit, and calculates, based on an electromagnetic field analysis, the reflection characteristics obtained when the electromagnetic wave enters the reconfigurable intelligent surface at the incident angle.