The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2025

Filed:

Jan. 15, 2021
Applicants:

Atik Co., Ltd., Seoul, KR;

Atonarp Inc., Tokyo, JP;

Inventors:

Young Ho Hong, Seoul, KR;

Hyun Sik Choi, Bucheon-si, KR;

Ki Woo Hong, Seoul, KR;

Hirofumi Nagao, Tokyo, JP;

Shinichi Miki, Tokyo, JP;

Assignees:

ATIK CO., LTD., Seoul, KR;

ATONARP INC., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01); G01N 1/22 (2006.01); G01N 1/24 (2006.01); G05D 7/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67253 (2013.01); C23C 16/45544 (2013.01); C23C 16/52 (2013.01); G01N 1/2226 (2013.01); G01N 1/24 (2013.01); G05D 7/0688 (2013.01); H01L 21/67017 (2013.01);
Abstract

Provided is a system for stabilizing a flow of gas introduced into a sensor, wherein, in connection with manufacturing equipment comprising a process chamber, a process chamber vacuum pump installed to remove internal gas of the process chamber, and a sensor device configured to be able to receive the internal gas of the process chamber through a sensor connecting pipe and to detect components thereof, the system comprises a sensor connecting pipe and a bypass pipe branching off from the sensor connecting pipe such that a part of the gas can be directly discharged to the outside without being introduced into the sensor, and the system is accordingly configured to stably provide the sensor device with a part of the internal gas within a predetermined range per time, regardless of a change in the pressure state of the process chamber.


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