The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2025

Filed:

Dec. 30, 2020
Applicant:

Comet Ag, Flamatt, CH;

Inventors:

André Grede, Bern, CH;

Daniel Gruner, Badenweiler, DE;

Anton Labanc, Ehrenkirchen, DE;

Roland Schlierf, Frechen, DE;

Nikolai Schwerg, Bern, CH;

Manuel Vor Dem Brocke, Bramsche, DE;

Assignee:

COMET AG, Flamatt, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32183 (2013.01); H01J 37/32926 (2013.01);
Abstract

A method for generating an RF signal preferably for a plasma chamber including the steps of: generating an input RF signal on the basis of a first set of control parameters; detecting at least one distorted RF signal; synchronizing the at least one distorted RF signal with the input RF signal; determining a difference between a target RF signal and the at least one distorted RF signal being synchronized; if the difference is larger than a predetermined threshold, determining a second set of control parameters based on the comparison of the target RF signal and the at least one distorted RF signal being synchronized; and generating an adapted input RF signal on the basis of the second set of control parameters such that the difference between the target RF signal and the distorted RF signal is reduced.


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