The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12474636 B1

Date of Patent:

Nov. 18, 2025

Filed:

Mar. 13, 2022

Pre-wet liquid, resist film forming method, pattern forming method, and kit

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventor:

Satomi Takahashi, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

JCIPRNET

Primary Examiner:

Jonathan Johnson

Assistant Examiner:

Alexander N. Lee

Int. Cl.

CPC ...

G03F 7/00 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01);

U.S. Cl.

CPC ...

G03F 7/0035 (2013.01); G03F 7/2006 (2013.01); G03F 7/32 (2013.01); G03F 7/40 (2013.01);

Abstract

The pre-wet liquid is provided. The pre-wet liquid has a surface tension of 29.0 mN/m or more, a viscosity of 1.8 cP or less, and a vapor pressure of 2.5 to 5.0 mmHg, in a case of consisting of a single solvent, the pre-wet liquid has an SP value of 25.0 MPaor less and does not have a benzene ring group, and in a case of consisting of a mixed solvent, the pre-wet liquid satisfies the requirement 1 in which is a mixed solvent consisting of only two or more kinds of organic solvents A having specific SP value and specific surface tension and having no benzene ring group or the requirement 2 in which is a mixed solvent of an organic solvent A and an organic solvent B having specific SP value and specific surface tension.

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